PhD

Computer - Aided - Design Of Focused Ion Beam For a Lithography System

        A complete computer aided design (CAD) by using optimization methods for the ion optical systems have been developed, by mixing the dynamic programming procedure and artificial intelligence technique. The relative spherical and chromatic aberrations coefficients were obtained according to figure of merit for the following optimized optical systems:

English

A COMPUTATIONAL OPTIMIZATION OF AN ELECTRON BEAM DEFLECTING SYSTEM

Both analysis and synthesis approaches of optimization method are used in the present work to finding the optimum design of magnetic and electrostatic deflectors which give rise to the minimum spherical and chromatic aberration. In magnetic deflector calculations, the synthesis approach is used; the saddle yoke deflection coil is used as the source of magnetic field, then some axial field distribution models are to be used and new field distribution model to be suggested. The moving objective lens concept is included in the computation of deflection field.

English