In this work, a DC planner magnetron sputtering system used. Which consists of a cylindrical chamber, made from (Borosilicate). It contains two circular electrodes made from stainless steel. The cathode electrode is carried the target material and permanent magnet while a glass sample, which must coat, is placed on the anode electrode. In this works, gold and silver used as a target materials. The objective of this study is to examine the effects of operating parameters such as, electrodes separation, sputtering current, and type of target materials on the properties of glass surface coated under the influence of magnetic field. The surface morphology for the coated samples are studied by atomic force microscopy (AFM). Furthermore, electron temperature, ion and electron densities and other plasma parameters are determined by a cylindrical single Langmuir probe where the pressure up to(0.2 mbar). It is found that a linear increase in electron and ion densities and an exponential decrease in electron temperature with five values of electrodes separation (3,4,4.5,5 and 6) cm. That was observed for gold and silver target materials. Also, the discharge voltage using gold target is greater than that for silver target. Electron temperature decreased for gold and silver targets as the electrodes separation increased. The ion density increased which caused increasing in average grain diameter, height at sputtering current, Id=30 mA , when the target is gold. However, the average grain diameter is decreased and the height of grain increased at Id=40 mA using silver target. On the other hand, the values of electron temperature using silver target is greater than that for gold target. Also, the relation of average grain diameter, height and roughness surface as a function of electrodes separation are nonlinear. The minimum average values of grain diameter, height are (90 nm) and (6 nm) respectively for using gold at Id =30 mA and d=4 cm. For using silver at Id =40 mA the minimum average grain diameter is also (90 nm) at d=5 cm and height is (5.5 nm) at d=4 cm. For all discharge currents (20,30,40,50 3and 60 )mA , the minimum average grain height at the same electrodes separation d=4 cm for using silver and gold target except the value of Id=50 mA, whom a maximum average grain height is obtained.Finally, the sputtering yield for silver target is greater than that for gold target.
