Design and Fabrication of Antireflection ZnO Thin Film by Using Different Techniques

In this work single layer antireflection coating of ZnO thin film has been designed and fabrication on glass and PSi substrates using pulse laser ablation (PLA) and spin coating techniques.Mainly, the work, divided into two parts, first: single antireflection of ZnO thin film using modified characteristics matrix to satisfy zero reflection condition theoretically. Second: ZnO nanoparticle deposited on different substrates using PLA which including the effect of duration pulse of 1000, 1500, 2000 pulses, Energy of 600, 700, 800 mJ and type of solvent by methanol and distilled water have been fabricated studied. In addition, spin coating method have been employed to synthesis this film.Structural and optical properties of prepared films have been characterized using XRD, SEM and EDX, and UV-Vis, respectively.XRD results revealed that the ZnO thin film have hexagonal structure with polycrystalline in nature with preferred orientation of (002). In addition, crystalline size was increased with the increasing of duration pulses at methanol solvent at fixed energy of 700 mJ, besides; in distilled water solvent at 700 mJ have low crystalline size at duration pulse of 1500 pulse. While at fixed duration of 1500 pulse, the crystalline size has low valne at energy of 700 mJ . As well as, the film deposited on glass and PSi substrate using sol gel method have crystalline size of (96.83and 85.16) nm respectively. Narrow FWHM and no phase change has been observed in all cases. SEM images showed that for all cases the films were homogenous with some island and cluster then cracking started to obtain with the increasing of increase the pulse number. Expected of film on glass prepared using PLA with methanol solvent of energy 700 mJ and pulse duration of 1500 pulse  which showed nanostructure like tree leaf. EDX analysis showed that the prepared films were free of defects and continmations.Optical properties including optical behavior, optical band gap energy and absorption coefficient as a function of a wavelength revealed that the prepared film have high transmittance behavior around 85% at visible region ranged of 300-800 nm with high optical band gap energy of  3.37 eV with blue shift toward short wavelength.